Modern Magnetic Systems
Article
2012
Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes
| Author(s): | Nadzeyka, A. and Peto, L. and Bauerdick, S. and Mayer, M. and Keskinbora, K. and Grévent, C. and Weigand, M. and Hirscher, M. and Schütz, G. |
| Journal: | {Microelectronic Engineering} |
| Volume: | 98 |
| Pages: | 198--201 |
| Year: | 2012 |
| BibTeX Type: | Article (article) |
| DOI: | 10.1016/j.mee.2012.07.036 |
| Electronic Archiving: | grant_archive |
| Language: | eng |
BibTeX
@article{escidoc:0276,
title = {{Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes}},
journal = {{Microelectronic Engineering}},
volume = {98},
pages = {198--201},
year = {2012},
author = {Nadzeyka, A. and Peto, L. and Bauerdick, S. and Mayer, M. and Keskinbora, K. and Gr\'event, C. and Weigand, M. and Hirscher, M. and Sch\"utz, G.},
doi = {10.1016/j.mee.2012.07.036}
}