Modern Magnetic Systems
Article
2015
Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications
| Author(s): | Jeong, H.-H. and Mark, A. G. and Lee, T.-C. and Son, K. and Chen, W. and Alarcón-Correa, M. and Kim, I. and Schütz, G. and Fischer, P. |
| Journal: | {Advanced Science} |
| Volume: | 2 |
| Number (issue): | 2 |
| Year: | 2015 |
| Publisher: | Wiley-VCH |
| BibTeX Type: | Article (article) |
| DOI: | 10.1002/advs.201500016 |
| Address: | Weinheim |
| Electronic Archiving: | grant_archive |
| Language: | eng |
BibTeX
@article{escidoc:0119,
title = {{Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications}},
journal = {{Advanced Science}},
volume = {2},
number = {2},
publisher = {Wiley-VCH},
address = {Weinheim},
year = {2015},
author = {Jeong, H.-H. and Mark, A. G. and Lee, T.-C. and Son, K. and Chen, W. and Alarc\'on-Correa, M. and Kim, I. and Sch\"utz, G. and Fischer, P.},
doi = {10.1002/advs.201500016}
}