Roll-to-roll UV nanoimprint lithography (R2R-UV-NIL) gains increasing industrial interest for large area nano- and micro-structuring of flexible substrates because it combines nanometer resolution with many square meter per minute productivity.
Small-area masters of functional nano and micro surface structures are readily available by various lithographic techniques like e.g. UV-, e-beam- or interference lithography. However, the upscaling of small-area nano- and micro-structured masters into medium size roller molds – often called shims - for R2R-UV-NIL production still remains a bottleneck in the large area nano-structuring process chain.
At JR MATERIALS we have installed a customized EVG 770 UV-NIL-stepper and are developing step-&-repeat UV-NIL processes and materials for the seamless upscaling of small-area masters into polymer shims for our R2R-UV-NIL pilot line with dimensions of up to 270 x 630 mm2. These polymer shims can be used either directly for short to medium R2R-UV-NIL manufacturing runs or get galvano-formed into nickel-shims for real long run production.
In this seminar the JR MATERIALS UV-NIL tools, processes and materials as well as a few applications will be presented.
Biography: Dieter Nees studied chemistry at the University of Siegen in Germany and gained a PhD in Physical Chemistry in 1996 with research on photochemistry in colloidal systems.
Then he spent two years as post-doctoral fellow in the Surfactant Science Group at the University of Hull in Yorkshire where he developed an interferometric method for measuring the contact angles of oil lenses floating on water surfaces.
After this he joined the Central Laser Facility of the Rutherford Appleton Laboratories in Oxfordshire where he built up an optical tweezers device for direct measurement of the interaction between individual colloid particles.
From 2000 on he worked for ten years as senior engineer in the semiconductor industry at Infineon/Qimonda in Dresden developing lithography processes from the quarter micron to the 45 nm DRAM technology knot.
In 2010 he joined JR MATERIALS, where he is developing UV-nanoimprint lithography materials and processes for large area high resolution structuring of surfaces particularly for micro-optic, micro-fluidic and biomimetic applications.